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| Decision field | Open accessGarment POM Definition & Verification RecordGlobalRemove | PaidCLOGlobalRemove |
|---|---|---|
| Decision fit | ||
| Primary job | Source production | Find patterns & fit |
| Also useful for | No additional job recorded | No additional job recorded |
| Area | Production | Patterns & fit |
| Best for | Turning an ambiguous POM name, code, or diagram into a reproducible method before setting targets, tolerances, or inspection decisions | Individual and team 3D garment prototyping |
| Know before using | The record does not reproduce licensed ISO measurement drawings, supply universal POM codes or targets, approve an internal method, prove measurement capability or product fit, or replace qualified technical-design, pattern, fit, quality, metrology, safety, and regulatory review. | A virtual sample or coloured fit map is not proof of physical fit, comfort, construction quality, manufacturability, or graded-size approval. Results depend on pattern geometry, sewing, avatar measurements and pose, fabric physical-property data, trims, mesh, and simulation settings. Current releases have substantial hardware and learning requirements; validate representative fabrics, bodies, movements, and sewn samples physically. |
| Practical access | ||
| For | Apparel brands | Both |
| Location or jurisdiction | Global | Global |
| Access | Open access | Paid |
| Format | Stitch Authority | Software |
| Source type | Stitch Authority | First-party platform |
| Source and review | ||
| What the source establishes | The guide cites current ISO garment-measurement, body-measurement, and textile-conditioning standards plus NIST measurement-process guidance for repeatability and reproducibility; it requires organization-specific codes, added points, targets, and tolerances to remain explicitly controlled. | CLO's current product and support documentation covers linked 2D pattern work and 3D garment simulation on avatars, grading review by size, fabric and garment visualization, fit maps for stress, strain, pressure, and tightness, and rendering and presentation output. Current system requirements publish separate Windows and Apple Silicon baselines and higher recommendations for complex simulation and rendering. |
| Linked page reviewed | Jul 16, 2026 | Jul 21, 2026 |
| Next review due | Jul 16, 2027 | Jan 17, 2027 |
| Inspect | ||
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